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Silica Polishing Slurry

Introduction:

The silica polishing slurry features a wide range of applications, high polishing efficiency, good polishing effect, low impurity content, and easy cleaning after polishing. Used on cerium oxide polishing sheets or polyurethane pads, it extends the life of the polishing sheet while achieving good polishing results, without causing physical damage to the workpiece, and can meet customer requirements.
The silica polishing slurry is a high-purity, low-metal-ion polishing product made from nano-silica (SiO2) through a special process, widely used for nano-level high-planarization polishing of various materials.
Products in different grit sizes (10~150 nm) can be produced to meet user needs.

Packaging: 500 ml/bottle

Storage:
Storage temperature 0~35 °C. Below 0 °C it fails due to the formation of non-redispersible gel; storage above 35 °C promotes microbial growth and accelerates gelation, shortening shelf life. Under these conditions, alkaline polishing slurry can be stored for about two years, and acidic polishing slurry for about half a year.

Dosage: recommended usage 3-12%; customers can test and select the dosage based on actual conditions.

Application fields: polishing of fiber optic connectors, ceramic ferrules, silicon PLC chips, compound crystals, silicon wafers, germanium wafers, compound semiconductor materials such as gallium arsenide and indium phosphide, precision optical devices, sapphire wafers, precision optical components, gems, etc.

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